Anchor Customer Presentations in 2010 SPIE Advanced Lithography Conference

With broadened applications of Anchor's products and increased collaborations with our customers, we are glad to see our tools have been used more and more in both IC design and manufacturing, including the area of yield enhancement. As a result, we are able to highlight some of the customer applications in this year's SPIE Advanced Lithography Conference in San Jose; in particular, how to apply Anchor's pattern-centric technologies to improve yield in advanced FPGA devices.

Below is the joint presentation of Xilinx and Anchor Semiconductor on "Systematic Failure Debug and Defective Pattern Extraction for FPGA Product Yield Improvement", by Cinti Chen and Joe W. Zhao of Xilinx; Ping Zhang and Raymond Xu of Anchor semiconductor.

The paper can be found in the Publications page. Contact us at info@anchorsemi.com if you have any questions/inquires.