Papers | Anchor Semiconductor
Papers

My Image
My Image
../resources/PDF/Net-Tracing-for-DVC-Defects.pdf,[iframe]

Net Tracing and Classification Analysis on E-Beam Die-to-Database Inspection.

Abstract Only. Please Contact Us for full transcript.

SPIE Vol. 9778 (2016)

My Image
My Image
../resources/PDF/Automatically-High-Accurate-and-Efficient-Photomask-Defects-Management-Solution-for-Advanced-Lithography-Manufacture.pdf,[iframe]

Automatic High Accurate and Efficient Photomask Defects Management Solution for Advanced Lithography Manufacture.

SPIE Vol. 9050-62 (2014)

My Image
My Image
../resources/PDF/CSTIC2014_Full-Paper_systematic-hot-spot-finding-by-pattern-search-with-similarity_Final_1216.pdf,[iframe]

Systematic Hot Spots Finding by Pattern Search with Similarity.

CSTIC 2014

My Image
My Image
../resources/PDF/2D_X_Final_2013_0110_1.pdf,[iframe]

Enhanced photomask quality control by 2D structures monitoring using auto image-to-layout method on advanced 28nm technology node or beyond.

SPIE Vol. 8681-60 (2013)

My Image
My Image
../resources/PDF/Manuscript-8327-41-Yield-impacting-systematic-defects-search-and-management.pdf,[iframe]

Yield impacting systematic defects search and management.

SPIE Vol. 8327-41 (2012)

My Image
My Image
../resources/PDF/126-LA433__DAC-2011.pdf,[iframe]

Defect Pattern Library Construction for the Lithography Hotspot Pattern Search based on a Two-Level 2D Pattern Matching.

DAC User’s Track (2011)

My Image
My Image
../resources/PDF/SPIE2010-7641-10_Systematic-Failure.pdf,[iframe]

Systematic failure debug and defective pattern extraction for FPGA product yield improvement.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/kernel-based_DFM_model_for_process_from_layout_to_wafer_ZheDa.pdf,[iframe]

A Kernel-Based DfM Model for Process from Layout to Wafer.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/7488_14.pdf,[iframe]

Simulation Based Mask Defect Repair Verification and Disposition.

SPIE Vol. 7488 (2009)

My Image
My Image
../resources/PDF/7122_73-DFM_Guideline_development.pdf,[iframe]

Design for Manufacturability Guideline Development: Integrated Foundry Approach.

SPIE Vol. 7122 (2008)

My Image
My Image
../resources/PDF/6925_37-OPC_Improvement.pdf,[iframe]

Improvement on OPC completeness through pre-OPC hot spot detection and fix.

SPIE Vol. 6925 (2008)

My Image
My Image
../resources/PDF/6924_146.pdf,[iframe]

Pattern Centric OPC Flow: a Special RET Flow with Fast Turn-Around-Time.

SPIE Vol. 6924 (2008)

My Image
My Image
../resources/PDF/6520_125.pdf,[iframe]

Distributed model calibration using Levenberg-Marquardt algorithm.

SPIE Vol. 6520 (2007)

My Image
My Image
../resources/PDF/5992_100.pdf,[iframe]

Post-OPC verification using a full-chip Pattern-Based simulation verification method.

SPIE Vol. 5992 (2005)

My Image
My Image
../resources/PDF/Design-guided-data-analysis-for-process-window.pdf,[iframe]

Design Guided Data Analysis for Summarizing Systematic Pattern Defects and Process Window.

Abstract Only. Please Contact Us for full transcript.

SPIE Vol. 9778 (2016)

My Image
My Image
../resources/PDF/CSTIC2014_Full-Paper_Smart_Sampling_Final-1216.pdf,[iframe]

Smart Review Sampling Methodology in Huge Inspection Results.

CSTIC 2014

My Image
My Image
../resources/PDF/Inspection-Flow-of-Yield-Impacting-Systematic-Defect_final.pdf,[iframe]

Inspection Flow of Yield Impacting Systematic Defects.

Joint Symposium of eMDC-2013 and ISSM-2013

My Image
My Image
../resources/PDF/Hotspot-Classification-Based-on-Higher-order-Local-Autocorrelation.pdf,[iframe]

Hotspot Classification Based on Higher-order Local Autocorrelation.

SPIE Vol. 8522-102 (2012)

My Image
My Image
../resources/PDF/8166_82.PDF,[iframe]

Simulation Based Mask Defect Printability Verification and Disposition, Part II.

SPIE Vol. 8166 (2011)

My Image
My Image
../resources/PDF/7971_16-Hynix.pdf,[iframe]

OPC Verification and Hot Spot Management for Yield Enhancement through Layout Analysis.

SPIE Vol. 7971 (2011)

My Image
My Image
../resources/PDF/Manuscript_OPC_Conflict_SPIE2010_final.pdf,[iframe]

Detection of OPC Conflict Edges through MEEF Analysis.

SPIE Vol. 7641 (2010)

My Image
My Image
../resources/PDF/7520-63.pdf,[iframe]

Hot Spot Management through Design Based Metrology - Measurement and Filtering.

SPIE Vol. 7520 (2009)

My Image
My Image
../resources/PDF/SPIE-manuscript-7272-53-YANG.pdf,[iframe]

Systematic Defect Filtering and Data Analysis Methodology for Design Based Metrology.

SPIE Vol. 7272 (2009)

My Image
My Image
../resources/PDF/7122_58-Rule_and_Pattern_based_hotspot_detection.pdf,[iframe]

Combination of rule and pattern based lithography unfriendly pattern detection in OPC flow.

SPIE Vol. 7122 (2008)

My Image
My Image
../resources/PDF/6925_29.pdf,[iframe]

A Procedure to Back-annotate Process Induced Layout Dimension Changes into the Post Layout Simulation Netlist.

SPIE Vol. 6924 (2008)

My Image
My Image
../resources/PDF/6520_172.pdf,[iframe]

A Feasible Model-Based OPC Algorithm Using Jacobian Matrix of Intensity Distribution Functions.

SPIE Vol. 6520 (2007)

My Image
My Image
../resources/PDF/6156_11.pdf,[iframe]

DFM: A Practical Layout Optimization Procedure for the Improved Process Window for an Existing 90-nm Product.

SPIE Vol. 6156 (2006)