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  • Innovative pattern-centric NanoScope™ DFM platform
  • Comprehensive and rich pattern analysis functions for design criticality filtering
  • Proprietary fast pattern compaction and pattern installation for pattern based OPC acceleration
  • Integrated defect pattern library for critical pa ttern storage and re-use
  • Proprietary fast pattern extraction and pattern search for effective pattern based defect grouping
  • Lithography model capable of 45nm node and beyond with immersion for process sensitivity analysis