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- Innovative pattern-centric NanoScope™ DFM platform
- Comprehensive and rich pattern analysis functions for design criticality filtering
- Proprietary fast pattern compaction and pattern installation for pattern based OPC acceleration
- Integrated defect pattern library for critical pa ttern storage and re-use
- Proprietary fast pattern extraction and pattern search for effective pattern based defect grouping
- Lithography model capable of 45nm node and beyond with immersion for process sensitivity analysis
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