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NanoScope-DPL™
NanoScope-DPL™ (Defect Pattern Library) is built on Anchor’s pattern-centric NanoScope platform. DPL provides patterning knowledge sharing and reuse, allows users to save patterns from different sources: litho-unfriendly patterns in OPC verification, problematic patterns in mask making, and yield limiting patterns in wafer printing. Using DPL as a pool of pattern samples, the built-in fast pattern search can easily identify and mark those patterns in early design phase. Understanding placement based printability issues for std. cells are easily found and dispositioned with the DPL tool. All operations and utilities are optimized for handling large number of patterns for speedy solutions.
Features and Benefits:
- Wide applications in both design and manufacturing domains— from OPC verification, mask making, wafer printing, and failure analysis
- Knowledge learned deposition and reuse—save the problematic patterns in OPC and manufacturing, process window and yield limiters
- Integrated pattern search engine for fast pattern search and pattern match
- Tagline information for each pattern facilitates pattern search/retrieval within DPL
- User-friendly GUI based operations with powerful viewing capability
- Selected pattern tile view
- Reference image attachment and viewing
 DPL Application Flow |
DPL GUI and pattern group tile view
Built-In pattern search |
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