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NanoScope-DPL™
Defect Pattern Library (DPL) is built on pattern-centric NanoScope platform. DPL provides utilities and interface for patterning knowledge sharing and reuse. It allows user to store and manage patterns from different sources: litho-unfriendly patterns in design check, post-OPC verification, problematic patterns in mask making, or yield limiting patterns in wafer printing. Using DPL as a pool of pattern templates, the built-in fast pattern search engine can easily identify and mark selected patterns in the early design phase. Layout and placement based printability risky areas for standard cells can be easily found. All operations and utilities are optimized for handling large number of patterns for speedy solutions.
Features and Benefits:
- Wide applications in design to manufacturing domains— from design process sensitivity check, post-OPC verification, mask and wafer printing, to failure analysis
- Knowledge learned deposition and reuse—save the problematic patterns in design, OPC, manufacturing, process window and yield limiters
- Integrated pattern search engine for fast pattern search and pattern match
- Tagline and index information for each pattern to facilitate fast pattern search/retrieval
- User-friendly GUI based operations with powerful viewing capability
- Selected pattern group tile view
- Reference image attachment and viewing
DPL Application Flow |
DPL GUI and pattern group tile view
Built-In pattern search |
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