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Hotspot Pattern Analyzer
Hotspot Pattern Analyzer provides powerful solutions for analysis and dispositioning of different types of violations found from design verification to manufacturing process characterization and monitoring. Integrated in NanoScope™ pattern-centric DFM platform, the hotspot analyzer takes hotspot reports from tools such as OPC verification or layout process sensitivity checking, as well as hotspots detected in manufacturing. It allows fast and interactive viewing of hotspot groups, alongside their design layout, and images from simulation and manufacturing. Its unique functions of pattern and cell extraction help users to quickly identify repeating patterns among a large number of violations. Through regrouping, sorting, filtering, and re-classification, the Hotspot Pattern Analyzer guides effective review sampling and enables individual or group hotspot disposition and tracking. The user-friendly interface provides a common communication platform within the tool between different users and clients.
The Hotspot Pattern Analyzer is available in standard module and two advanced option modules.
Standard Module
Features:
- Flexible data format for multiple source import and conversion with original groups or classifications maintained
- Multi-format histogram views of hotspot groups, filtering, and statistics
- Hotspot layout display – individual or group tile view, chip-map view
- On-screen multiple layout pattern overlay, movement, and comparison
- Individual or group hotspot disposition and status tracking
- Unlimited user definable hotspot review status
- Wafer or mask image overlay with design layout
- User-friendly GUI operation
Multiple views of hotspot groups
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SEM image overlay with design data
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Advanced Options
- Pattern extraction module
Pattern extraction option module utilizes Anchor’s unique pattern match and analysis techniques to re-group hotspots by localized layout or hierarchical design cells. It identifies and groups repeating patterns based on user selectable matching area.
Features:
- Match and extract the same pattern groups on millions of locations in minutes
- Flexible CPU control for the best performance and time-to-results
- User definable extraction pattern area radius
- Choices of orientation dependent pattern extraction and matching
- Extract and rank patterns based on design hierarchy and cells
- Greatly reduces large number of hotspots to smaller number of pattern and cell related groups
- Identify and rank problematic repeating patterns and design cells
- User definable tolerance to account for small layout differences in pattern match
- Pattern complexity extraction module
This option will pre-group a list of hotspots based on design pattern complexity and density around the vicinity of hotspot locations.
Features:
- Separate and group hotspots between no design pattern areas and large pad areas
- Separate and group hotspots based on the closeness to critical design patterns
- Identify and rank hotspot severity based on local design pattern complexity
- Identify criticality of hotspot based on locations of design patterns
Applications
- Design and pattern based hotspot review, individual or group hotspot disposition and status tracking
- Design and pattern based analysis of OPC verification results
- Design and pattern based analysis for results from layout process sensitivity checking
- Design and pattern based analysis, grouping, and filtering for hotspots detected in manufacturing
- Pattern based analysis of MRC results
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