The NanoScope™ Modeler: generates accurate lithography process models. It has been production proven at 130nm, 90nm, 65nm and 45nm technology nodes. It provides physical tuning parameters to simulate mask distortion and resist loading effects. Distributed computing enables fast and accurate model calibration with user-definable model tuning sequences in both GUI and batch modes.

Features and Benefits:

• Scalar mode or vector mode for the optical component of simulation
• Capable of modeling immersion lithography with top-coated resist film stack
• Proprietary mask distortion modeling technique
• Advanced illumination and polarization handling
• Distributed computing enables fast calibration
• Both ADI model and AEI model can be built with flexible algorithm selection
• GUI mode and Batch mode model tuning optimization
• Multiple points model covers whole process window
• Process Window fitting capability

Illumination	Predicted contour
Process Window Tuning