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NanoScope-PRV™
NanoScope-PRV™ is a model-based, pattern-centric full chip Post-RET/OPC verification software solution. Its production-proven technology leads the industry in accurate lithography process modeling and contour simulation, comprehensive defect inspection and analysis, and process window limiter pattern extractions. It provides inspection accuracy with no compromise in performance for critical OPC verification before mask making.
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Features and Benefits:
- Accurate and fast model-based full-chip post-RET/OPC verification running on generic Unix/Linux based networks
- Comprehensive inspection functions for full process window RET/OPC verification—covers all design and all critical layers:
- Line width and space CD based error detections
- Bridge and break detection
- Hole size and area coverage
- Gate CD uniformity
- Line-end pull back and end cap length
- SRAF printability, side-lobe detection and more
- Pattern-centric technology and distributed computing – fast turn around time for large designs and advanced technology nodes
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OPC error found by PRV and corresponding SEM image
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NanoScope-PRV flow
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